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2013 R&D 100 Winner
ANL Nanocomposite Charge Drain CoatingsElectrostatic charging can be an annoyance at the macroscale; but in development of ion- and electron-optical devices, as well as microelectromechanical systems, this phenomenon can be severely detrimental to performance. In response, Argonne National Laboratory and KLA-Tencor Corp. have designed thin films that can prevent electrostatic charge from accumulating on virtually any surface. These Nanocomposite Charge Drain Coatings can be deposited over complex 3-D surfaces, offer excellent stability over a wide range of operating conditions and high electric fields. Fabricated using atomic layer deposition, thehe coatings seamlessly blend both conducting and insulating materials. By controlling the ratio of these components, the resistivity of the charge drain materials can be adjusted over a wide range to suit a particular application.

Technology
Nanocomposite coatings

Developers
Argonne National Laboratory
KLA-Tencor Corp.


Development Team

Nanocomposite Charge Drain Coatings development team.

 










The Nanocomposite Charge Drain Coatings Development Team
Alan Brodie, Principal Developer, KLA-Tencor Corp.
Jeffrey Elam, Principal Developer, Argonne National Laboratory
Anil Mane, Pricipal Developer, Argonne National Laboratory
William M. Tong, Principal Developer, KLA-Tencor Corp.

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