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Study of helium ion beam exposed nanostructures by in situ AFM

Wed, 10/02/2013 - 12:02pm
Nils Anspach and Frank Hitzel, DME Nanotechnologie GmbH, Endré Majorovits and Fabián Pérez-Willard, Carl Zeiss Microscopy

Scanning electron microscopy image of patterned atomic force microscopy cantilevers used in the Zeiss Merlin to examine nanostructures.In a new white paper from Carl Zeiss Microscopy, scientists from DME Nanotechnologie GmbH and Zeiss demonstrate the power of the AFM/SEM combination found in the Zeiss Merlin series microscopes for the analysis of helium ion beam exposed nanostructures.

The AFM Option for the Zeiss Merlin series combines an innovative high end atomic force microscope (AFM) with a scanning electron microscope (SEM). The combination allows In situ high-resolution AFM measurements in the SEM and opens up new possibilities for the characterization of a variety of nanostructures. Accurate quantitative 3-D topographical data in the sub-nanometer scale can be acquired by the AFM, in addition to information about mechanical, electrical and magnetic properties as well as chemical surface potential. The SEM can set these analyses in relation to macroscopic dimensions in the sample.

This solution was effectively used to examine an array of ring nanostructures produced with the helium ion beam of the Zeiss Orion NanoFab.

Helium_Ion_Beam_Study_Zeiss_Microscopy.pdf

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