Product Releases

Scanning Electron Microscope

Tue, 12/17/2013 - 2:59pm


At M&M 2013, Indianapolis, ZEISS launched the next generation EVO series for material and life science applications. According to ZEISS, customer productivity and imaging performance are dramatically increased by the SEM’s workflow automation, beam deceleration technology, and its HD BSE detector.

EVO reduces a typical workflow from over 400 steps to just 15. Workflow productivity is improved by automated image settings such as the beam alignment, magnification and focus, allowing the imaging of areas of interest in the shortest possible time. A user-friendly mid-column click-stop aperture changer is introduced for reliable and reproducible results.

EVO allows imaging of exceptionally fine surface details with crisp contrast. Beam deceleration technology and a high definition BSE detector provide images rich in topographical information. When combined with EVO HD beam source technology, this ZEISS system sets a new standard in image quality from conventional scanning electron microscopes.  

The EVO series continues to offer full environmental capabilities, three chamber sizes and class-leading x-ray geometry.

Source: ZEISS




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