FEI Co. has announced performance enhancements for its DualBeam systems. The EasyLift nanomanipulator allows for improved ease of use, reliability, precision, and integration in preparing ultrathin samples for analysis in a transmission electron microscope (TEM). The MultiChem gas delivery system, used for direct beam-induced deposition and etching of materials, provides control and flexibility over the gas-injection process and features simplified maintenance.

EasyLift is designed specifically for in-situ liftout (INLO) TEM sample preparation and other demanding nanomanipulation activities.

The MultiChem targets applications where it is critical to further improve the properties of the materials deposited, better optimize the deposition of preferential etching process parameters, or etch materials with new gases.

Better control over the gas injection parameters and full integration are essential to bring beam-induced deposition and etching to the next level, such as the deposition of materials with higher purity or of more complex and controlled contents. Together with the iFast automatic framework, MultiChem allows for even more systematic studies and optimization of beam chemistry processes in an automated way and over a larger range of chemistries.

FEI Co., www.fei.com