FEI Company announced the release of the Tecnai Osiris scanning/transmission electron microscope (S/TEM), delivering revolutionary analytical speed and performance. It includes FEI’s new ChemiSTEM technology, which reduces the time for large field-of-view elemental mapping from hours to minutes. The Tecnai Osiris is designed to combine this breakthrough analytical throughput with exceptional ease-of-use to meet the requirements for both high-volume industrial and multi-user research laboratories.
The patent-pending ChemiSTEM technology enables the Tecnai Osiris to achieve a factor of 50 or more enhancement in speed of energy dispersive x-ray (EDX) elemental mapping, by combining technical advances in beam generation with disruptive changes in EDX signal detection. The Tecnai Osiris is built on a platform designed to maximize productivity and return on investment in high-volume analysis.
The Tecnai line has a long history of performance and reliability as a workhorse tool in industrial applications. The Tecnai Osiris, a 200 kV S/TEM, continues the Tecnai tradition with the addition of numerous technical innovations, including: ChemiSTEM, which comprises the proprietary X-FEG high brightness electron source and Super-X, FEI's new EDX detection system based on Silicon Drift Detector (SDD) technology; MultiLoader sample handling that reduces thermal equilibration time after sample exchanges by ten times with commensurate improvements in time-to-data; and the new FS-1 electron energy loss spectrometer that improves electron energy loss spectrometry (EELS) speed and sensitivity; as well as other enhancements, such as the SmartCam remote control camera, long-life liquid nitrogen supply, and more.