Edwards has expanded its Zenith range of integrated exhaust management systems with a new offering incorporating the iXH harsh process vacuum pump and the Atlas family of gas abatement solutions. This expansion of the Zenith range offers semiconductor manufacturers an efficient answer to the increasing vacuum and abatement demands for advanced semiconductor processing at the 60 nm and smaller design rules.
The Zenith integrated vacuum and abatement systems offer a range of turn-key, process-centric exhaust management solutions for semiconductor manufacturing. All components are integrated, and each function is supported by a control interface. The Zenith range provides full internal distribution, as well as regulation and monitoring of all services. A Zenith exhaust management solution can reduce system footprint by up to 70% and can reduce utility hook-ups by over 60%.
The iXH series of dry pumps for harsh processes offer greater process capability compared to previous-generation Edwards pumps. They feature a wide temperature range, which helps minimize by-product accumulation; increased powder-handling capabilities; and a Gas Buster technology; as well as a pump seal technology that helps lengthen process life and reduce leakage risks. iXH systems also help to expand process windows, thereby helping to improve yields. They have a smaller footprint than previous generation pumps.
The Atlas combustion-based abatement family offers a range of abatement systems tailored to the needs of individual semiconductor manufacturing processes, such as CVD and etch. They consume half the fuel of previous-generation abatement systems, thereby reducing operating costs. The Atlas family was specifically designed to increase ease-of-use and simplify maintenance operations. A combination of field-proven combustion abatement and wet scrubbing stages provide exceptional abatement performance, excellent powder handling, and resistance to corrosion.
Edwards Vacuum, www.edwardsvacuum.com
